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SHIBAURA MECHATRONICS CORPORATION
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SC Series/SC3001 Single Wafer Wet Cleaning Equipment

SC Series/SC3001 Single Wafer Wet Cleaning Equipment

Cleans wafers using chemicals and pure water to remove dust and stains that cause defects in the semiconductor wafer manufacturing process.

Features

  • High performance
    High levels of cleanliness and high uniformity through single wafer cleaning
    Free from cross contamination
  • Low COO
    Reduction of chemical costs by utilizing functional water
    Wet cleaning with small volume of chemicals
    Small footprint
  • Environmentally friendly
    RCA-free cleaning and low chemical consumption
    Energy saving process using room temperature cleaning





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