SHIBAURA
SHIBAURA MECHATRONICS CORPORATION
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Microwave Plasma Processing Equipment

Microwave Plasma Processing Equipment

Reform surface of plastics with thin air ionized by microwave energy.
The surface is reformed by high-density low temperature plasma without being affected by the microwave, improving hydrophilicity and adhesiveness.
A wide-ranging product lineup covers a small chamber type for laboratory use to large equipment with a 2m diameter for plasma processing.

Features

Microwave output 1.5kW×1 (2M164×1)
Oscillation frequency 2450±30MHz
Plasma generating system 1 system
Exhaust pump 3000L/min
Throughput 40 to 670Pa (0. 3 to 5Torr)
Chamber dimensions Φ600×Length 800mm

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