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SHIBAURA MECHATRONICS CORPORATION
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CDS-6PH Sputtering Equipment for Master Disc Process

CDS-6PH Sputtering Equipment for Master Disc Process

Dedicated sputtering equipment developed for forming Ni film of disc stamper.

Features

  • Operator-free fully automated operation
    Continuous production is supported by connection of the developing machine and scalar robot for the stamper and a newly developed disk chuck mechanism with a highly accuracy door control mechanism
  • Space saving design
    Saves space thanks to investigation of the parts layout at the design stage to enhance maintainability
  • Optimized balance system
    Optimum system design gets maximum performance from the cryo-pump and DC power supply for sputtering, assuring quick evacuation by the small vacuum pump and highly efficient film sputtering
Vacuum
characteristics
Ultimate
pressure
3 x 10-5 Pa
Pumping
characteristics
Within 5min to 2 x 10-5 Pa
Sputtering
characteristics
Substrate
dimensions
Max. diameter Φ240 Max. thickness 6mm
Film thickness
distribution
Within ±5% (withinΦ120)
Sputtering
source
5-inch (within Φ127) cathode x 1 unit DC500W
Film forming
speeds
Ni 8 to 24nm/min
Cycle time (reference value) Stamper for disc 20min/disc
(Condition: base pressure 2 × 10-3 Pa film thickness 50nm)

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