Ideal for cleaning low temperature polysilicon TFT; matches the cleaning performance required for semiconductor manufacturing.
- Minimized cross contamination
Cuts cross contamination, a potential problem in LTPS manufacturing, to the level demanded for semiconductor manufacturing equipment.
- Low COO
Realizes “eco-friendly cleaning” by reducing the installation
space to 1/5 and minimizing the use of chemicals and pure water.
- New process based on electro-chemical principles
Realizes rationalized removal of contaminants by a combination of
functional water, acid chemicals and our original “Megasonic”